The PPS500D-4-H can control up to two sources which can be any combination of compact magnetron sputter heads or glow discharge heads. Sputter sources can be positioned on separate chambers even. The efficient glow discharge head used together with air as the process gas gives excellent plasma/ion cleaning of substrates and other critical parts such as TEM grids. With the glow discharge, hydrocarbons or biological material can also be etched.
The PPS500D-4-H also features a vacuum gauge interlock and can be used as a standalone table-top device or rack mounted and is only 2U total height.
Extremely stable output allows for operating the sources even at low powers (<2W), which makes this device unique in its class and ideal for low rate and precise coating applications.
Arc Detection and Suppresion – guaranteed by fast response loop in less than 95ns.
The following table provides an overview of available DC Power Supply models:
|Mode of operation||DC||DC||DC||DC||DC||DC|
|Communication Interface||I/O, RS-232, EthernetIP||I/O, RS-232, EthernetIP||I/O, RS-485, EthernetIP||I/O, RS-485, EthernetIP||I/O, RS-232, EthernetIP||I/O, RS-485, EthernetIP|
* Reffer to Technical Data of particular product for details