Sputtering plasma
PPS500 DC Power Supply
The PPS500D is a versatile dual source power supply for R&D coating & cleaning applications of 500W max power with with extremely high accuracy of 0.1 mA,V and W only. It is excellent power source for low power R&D application. It can control up to two sources which can be any combination of compact magnetron sputter heads or glow discharge heads. Sputter sources can be positioned on separate chambers even. The efficient glow discharge head used together with air as the process gas gives excellent plasma/ion cleaning of substrates and other critical parts such as TEM grids. With the glow discharge, hydrocarbons or biological material can also be etched.
PPS1500 DC Power Supply
The PPS Pulse DC Magnetron Power Supplies are versatile dual source power supply combining DC and unipolar PulseDC operating modes available for R&D coating & cleaning applications. It can control up to two sources which can be any combination of compact magnetron sputter heads or glow discharge heads. Sputter sources can be positioned on separate chambers even. The PPS can be used as standalone table-top device or rack mounted.
Remote control is possible via RS232 or RS485 and LAN/Ethernet
PPS3000 DC Power Supply
Universal high-voltage power supply for plasma applications. Widely used to drive magnetron sources where the required power does not exceed 3000W.
The latest in electronics standards place the PPS3000D at the highest level, with exceptional stability and with user friendly features such as “Easy control” which allows device control via mobile devices and through the internet.